Simulations of Temperature Field in HFCVD Diamond and its Application
LI Han-qi
LI Zheng-xin
YUAN Zhi-zhong
Abstract：Hot-filament chemical vapor deposition ( HFCVD) is an effective method for large area diamond film growth. In the process of growing,the uniformity of temperature and the temperature of the substrate are the key factors. The progress of research for thermal field simulation and parameter optimization on large area diamond film growth by HFCVD is summarized in this article. Moreover, the existing problems and development on it are put forward in this pa-per.
Keywords：hot filament chemical vapor deposition( HFCVD)diamond filmtemperature fieldsimulationreview
Publication Date：2015-01-01
Online Publishing Date：2025-08-15(First online date of this platform, not the publication date of the document)
Pages：5( 64-67,79 )