Heat Dissipation Optimization of Mercury Xenon Lamp Light Source System for Wafer Edge Exposure
ZHANG Shaochun
MA Yujun
TIAN Yu
ZHANG Xueshi
YANG Jie
HAN Qiuyi
ZHANG Shanduan
Abstract：Wafer edge exposure is a key lithography technology for handling photoresist residue on the wafer edge,vital for enhancing semiconductor device manufacturing accuracy and production efficiency.The mercury xenon lamp source system,the core of the edge exposure unit,has a high operating wall temperature,causing uneven reflector bowl surface temperature and unstable UV irradiance.This paper designs single and double annular air ducts based on the annular pipe flow distribution model to address the reflector bowl's uneven temperature issue.By analyzing parameters such as the opening angle,quantity and diameter,as well as the diameter of the annular air duct and the inner diameter of the pipe,the optimization scheme is determined to be an opening angle of 90°,the number of openings of 6,the opening diameter of 7 mm,the diameter of the annular air duct of 95 mm,and the inner diameter of the pipe of 15 mm.Simulation and experimental results show that the optimized structure increases the reflector bowl surface temperature uniformity to 98.2％and reduces UV irradiance instability to 1.1％,offering significant reference for domestic high-stability edge exposure light source system designs.
Keywords：mercury xenon lampedge exposureheat dissipation structure designultraviolet radiation characteristics
Publication Date：2025-12-31
Online Publishing Date：2026-01-08(First online date of this platform, not the publication date of the document)
Pages：11( 90-100 )