Exploring the Application of Photogrammetry Technology in Optimizing Building Lighting Layouts
YANG Li
Abstract:The article elaborates on the superiority of photogrammetry technology in obtaining three-dimensional shape,surface material and environmental condition information of architectural space,providing a foundation for establishing a lighting simulation platform to accurately predict contrast distribution and comfort.In addition,the article further elaborates on the entire process of photogrammetry technology assisting in the optimization design of lighting layout,and verifies the unique advantages of photogrammetry technology through practical cases,with the aim of providing technical support for the optimization of architectural lighting design.
Keywords:photogrammetryarchitectural environmentlightinglayout optimisation
Publication Date:2025-09-25
Online Publishing Date:2025-10-14(First online date of this platform, not the publication date of the document)
Pages:3( 82-84 )
China Light & Lighting

China Light & Lighting

ISSN:1002-6150
Year, Vol.(Issue):2025,(9)