Role of 808-nm photobiomodulation in modulating itch behavior following deep partial-thickness burn injury in rats
FANG Ke
LI Jialong
YUAN Leyi
WANG Tong
YU Zhou
SONG Baoqiang
Abstract：Objective To observe the effect of 808 nm photobiomodulation(PBM)on early-stage itch behavior and evaluate its role in burn wound healing and the prevention of itch occurrence.Methods A deep partial-thickness(second-degree)burn model was established on the backs of rats using a heated copper block method.Intervention with 808 nm near-infrared light was administered after injury.Itch behavior was assessed via a scratching test;pathological differences were observed through HE and Masson staining;and transcriptome sequencing was used to compare the transcriptional profiles of wounds across different groups.Results Compared with the burn control group,the PBM group showed an increased wound healing rate and enhanced collagen deposition.No significant increasing trend was observed in itch-related scratching behavior.Transcriptome analysis revealed that PBM primarily affected immune-and metabolism-related pathways,with no significant enhancement of neurostimulation-associated signaling.Conclusion PBM with 808 nm promotes burn wound repair without increasing the burden of itching.This suggests it has good safety and potential for application during the early intervention stage for combat and burn injuries,providing an experimental basis for the deployment of non-pharmacological rapid intervention methods in military medical support.
Keywords：photobiomodulationburnsprurituswound healingcollageninflammationtranscriptomemetabolism
Publication Date：2026-03-31
Online Publishing Date：2026-08-26(First online date of this platform, not the publication date of the document)
Pages：5( 416-420 )