Investigation for Metal Lift-off Process in RF MEMS Switch
Abstract：The lift-off processes of BP212 positive photoresist （and chlorobenzene treatment） and AZP4620 positive photoresist （and chlorobenzene treatment） were studied. AZ5214E image-reversal photoresist was also studied. Side wall graphics were observed using scanning electron microscope （SEM）. The forming mechanism of different lateral wall pattern was analysed. The optimum process parameters were found and used in metal lift-off in RF MEMS switches.
Keywords：BP212AZP4620AZ5214Echlorobenzene treatmentlift-off
Publication Date：2012-01-01
Online Publishing Date：2025-08-15(First online date of this platform, not the publication date of the document)
Pages：4( 10-13 )