Influence of Oxidation Temperature on the Structure of Graphene Oxide
XU Changan
HU Yang
YANG Zhuohong
Abstract：Graphene oxide(GO)containing different functional group structures was prepared by oxidation of graphene materials at high temperature(90℃)and low temperature(40℃).The functional groups,crystal structure,element content,heat resistance,and morphology of the prepared GO were character-ized by Fourier transform infrared spectrometer,X-ray diffractometer,Raman spectrometer,X-ray photo-electron spectrometer,thermogravimetric analysis,and scanning electron microscope.The results showed that the formation of carboxyl groups on GO was favorable at high temperature(GO-H),while the forma-tion of epoxy groups on GO was favorable at low temperature(GO-L).GO prepared by different methods had similar crystal structure,and the defects generated on GO-L(ID/IG=2.16)were higher than those on GO-H(ID/IG=1.41),but the heat resistance of GO-L was higher than that of GO-H.In addition,af-ter the graphene material was oxidized,the layer spacing was increased from the original 0.34 nm to 0.80 nm,which proved that the interlayer force of GO was effectively weakened.This work provided ex-perimental basis and theoretical basis for preparing GO materials with different structures and properties.
Keywords：graphenegraphene oxideoxidation temperatureheat resistancefunctional groupcrystal structure
Publication Date：2024-08-28
Online Publishing Date：2026-08-28(First online date of this platform, not the publication date of the document)
Pages：7( 57-63 )