Fabrication of Curved Grating Structures Using Electrostatic Induced Lithography
LI He-fu
ZHAO Nan
TIAN Cun-wei
FENG Zhen-bao
YU Hui-shan
WANG Wen-jun
Abstract：The grating structures was prepared on convex substrate by soft lithography.The grating structure on the convex surface substrate was then used as a template.We fabricated the grating structure on a concave surface using electrostatic induced lithography.The height of the mold grating structure was 5.3μm, the stripe width was 6.25μm, and the aspect ratio was 0.85∶1.The height of the induced grating structure was 42μm, the stripe width was 13.35μm, and the aspect ratio was larger than3∶1.The results demonstrated that high aspect ratio microstructures can be obtained on curved surfaces by using electrostatic induced lithography utilizing a master with a much lower aspect ratio.
Keywords：soft lithographyelectrostatic induced lithographygrating structurehigh aspect ratiocurved substrate
Publication Date：2018-01-01
Online Publishing Date：2026-08-28(First online date of this platform, not the publication date of the document)
Pages：6( 52-57 )